讲座时间（Date）：2018年5月3日上午10：30

讲座地点（Place）：清水河校区五号科研楼ERC中心会议室（三楼351）

讲座题目（Title）：Monolithically Integrated On-chip magneto-optical isolator with 3 dB insertion loss

主讲人（Presenter）：Qingyang Du

报告简介(Abstract)：

Under the vast development of Photonic Integrated Circuits (PICs) industries, on-chip optical isolators, the missing link in PICs, has become an increasingly critical component as they protect light sources from any undesired back-reflection disruption. So far, making low insertion loss and high isolation ratio monolithically integrated magneto-optical on-chip isolators have been a major challenge due to the large absorption of the magnetic material and high scattering losses in the device. In this talk, we report a monolithically integrated strip-loaded chalcogenide glass waveguide micro-racetrack isolator with a record low insertion loss of 3 dB and large extinction ratio of 40 dB, by leveraging grayscale lithography to produce a vertical taper in the device structure, and improved deposition process to allow highly crystallinity of magnetic materials. Our work has developed a novel technology to the production of low loss on-chip magneto-optical isolators.

主讲人简介(Resume of the presenter)：

Qingyang Du is a PhD candidate at Massachusetts Institute of Technology. He received his BS in materials physics in 2012 from University of Science and Technology of China. His research interests covers on-chip photonic isolator, radiation damage in photonic materials and devices and nonlinear photonics in chalcogenide glasses.